This study employs high-power impulse magnetron sputtering (HiPIMS) to fabricate silicon-doped diamond-like carbon (Si-DLC) films. A systematic investigation was performed to evaluate the effects of varying sputtering power levels on the microstructural characteristics, mechanical attributes, and tribological behavior of the Si-DLC films. The results demonstrate that adjusting the sputtering power in the HiPIMS process significantly affects the surface morphology and chemical composition of the Si-DLC films. Specifically, the surface roughness (Ra) of the Si-DLC films initially decreases and then increases with higher power levels, whereas the sp 3/sp 2 structure ratio of the films gradually rises. Conversely, the nanohardness of the films initially increases and then decreases with increasing power, while the elastic modulus exhibits a slight decline. Friction test results reveal that Si-DLC films with lower silicon content exhibit enhanced high-temperature friction performance, Notably, films prepared at 600 W display an average friction coefficient of 0.03 at 300 °C. In contrast, films deposited at 900 W exhibit higher friction and wear rates, and lose their lubricity at 300 °C due to the formation of silicon oxide and various carbide particles. The predominant wear mechanism at high temperatures is identified as a synergistic interplay of shear-induced graphitization, tribo-oxidation, and abrasive wear.